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The material selection platform
Coatings Ingredients
The material selection platform
Coatings Ingredients
by SpecialChem
 
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50 products match your search
Product Name
Supplier
Description
Chitec Technology
Chivacure® 70 by Chitec Technology is an oligomeric, polyfunctional alpha-hydroxyketone photoinitiator. It exhibits high reactivity, non-yellowing and non-migration properties. It is compatible with most... view more
DOWSIL™ 100F Additive by Dow is a fluorosilicone (1%) in diisobutyl ketone. Acts as a defoaming agent. It exhibits good surface appearance even after long-term storage. Provides efficient foam... view more
DOWSIL™ 163 Additive by Dow is a silicone antifoam compound. Acts as a defoamer. Possesses low viscosity and contains no solvents. Used in water-based and solvent-based screen printing ink... view more
DOWSIL™ 27 Additive by Dow is a solvent-less, non-reactive, silicone glycol surfactant with both silicone and organic characteristics. It is primarily used in reducing coefficient of friction... view more
DOWSIL™ 402 LS Additive by Dow is a silicone polyether copolymer-based, BTX-free additive that has multi-functional benefits including improvements in flow & leveling, slip, anti-blocking, and... view more
DOWSIL™ 55 Additive by Dow is a reactive silicone glycol surfactant with carbinol functionality. Acts as a flow/leveling agent and mar resistance agent. Provides slip and improves flow-out, wetting... view more
Dapro® DF 20 by Elementis is a blend of glycols and modified polysiloxanes. Acts as a defoamer. It is an off-white liquid. Suitable for UV inks and clear overcoats. Also effective in many water-based... view more
Polyether siloxane copolymer. Used as a flow/leveling and slip additive for waterborne, radiation-curing and solventborne formulations in overprint varnishes, silk screen inks, industrial coatings... view more
Tego® Glide 440 is a flow/leveling and slip additive by Evonik. Offers improved scratch resistance. Is highly effectiev and highly compatible (minimized risk of haziness). Produces a slippery handle... view more
Polyether siloxane copolymer. Used as a flow/leveling and slip additive for waterborne, radiation-curing and solventborne formulations in wood and furniture coatings, architectural coatings... view more
2-Isopropylthioxanthone. Acts as a highly efficient free radical type II photoinitiator. It is used to initiate the photopolymerization of chemically unsaturated prepolymers, e.g. acrylates, in... view more
IGM Resins
Omnirad 500 by IGM Resins is a highly effective liquid photoinitiator, used for UV-polymerisation of suitable resins. The low viscosity allows lower of the viscosity of the total formulation.It is... view more
IGM Resins
Omnirad 819 DW (Former Irgacure 819DW) by IGM Resins is a versatile photoinitiator for radical polymerization of unsaturated resins upon light exposure. It is especially suited for the curing of... view more
IGM Resins
Omnirad EHA by IGM Resins is a highly efficient amine synergist which, when used in conjunction with type II photoinitiator, generates free radicals that initiate radical polymerization of unsaturated... view more
IGM Resins
Omnirad TPO - L by IGM Resins is a highly efficient, liquid, type I photoinitiator used to initiate radical polymerization of unsaturated oligomers such as acrylates and unsaturated polyesters containing... view more
IGM Resins
Omnistab IN 518 by IGM Resins is an effective liquid polymerization inhibitor or storage stabilizer for photosensitive resins and monomers. It retards the self-polymerization of UV-coating and ink... view more
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