ADDITOL® EPD by allnex is an amine co-initiator for radical UV curing. In combination with a hydrogen abstraction photoinitiator such as ADDITOL® ITX, ADDITOL® EPD is used in formulations containing... view more

ADDITOL® ITX by allnex is used as a radical photoinitiator for curing of inks and pigmented coatings. In combination with amine co-initiators or alpha cleavage photoinitiators, it is used in... view more

ADDITOL® TPO by allnex is a radical photoinitiator that can be used alone or in combination with other photoinitiators. It is used in formulations containing unsaturated materials such as acrylates... view more

PHOTOINITIATOR BDK by Cheermove acts as a photoinitiator. It has excellent thermal stability and high quenching resistance. It is widely used in UV curing systems with strong absorption in UV inks... view more

PHOTOINITIATOR DETX by Cheermove is a highly effective type II photoinitiator. It is used in screen inks, coating on plastics, wood coatings, lithographic & flexo inks. It has good mutual... view more

PHOTOINITIATOR ITX by Cheermove is an efficient, free radical type II photoinitiator for transparent or colored UV-curable inks and coatings. It is used in offset printing ink, screen ink, flexo... view more

Chivacure® 169 by Chitec Technology is an odor-free, norrish-type I photoinitiator, used to initiate the polymerization of UV-curable resins. It provides great photo speed, excellent formulation and pigment... view more

Spherical, micronized carnauba wax. Acts as a matting agent. Has low drop point and high hardness. Offers guaranteed particle size of 99% < 15 μm and constant as well as narrow particle size... view more

Spherical, micronized montan wax. Has high matting, ideal surface properties as well as very good adhesion on porous, uneven, flexible and soft substrates. Offers guaranteed maximum particle size... view more

Micronized montan wax. Has matting effect, ideal surface properties and very good adhesion on uneven, porous, flexible and soft grounds. Is less hydrophobic than other micronized waxes. Offers... view more

Spherical, micronized modified Montan wax. Has very good rub and scratch resistance. Also possesses matting, ideal surface properties, very good adhesion on porous, uneven, flexible and soft... view more

ACumist® 3105B is a high molecular weight, micronized PTFE-modified polyethylene homopolymer by Honeywell. Provides excellent slip, excellent abrasion- and blocking resistance. ACumist® 3105B is... view more

ACumist® 3205B by Honeywell is a micronized PTFE-modified polyethylene homopolymer with high molecular weight. Used in high-gloss and general-purpose solvent-borne, UV/EB cured coatings, stains... view more

ACumist® 3405 by Honeywell is a micronized PTFE-modified polyethylene homopolymer. It has a high molecular weight. Provides excellent abrasion resistance, outstanding slip and excellent scratch... view more

ACumist® B-6 is a micronized polyethylene homopolymer by Honeywell. Designed for use in general purpose and high gloss solvent-borne & UV/EB cured coatings, can & container coatings, solvent-based... view more

ACumist® C-5 by Honeywell is a micronized polyethylene homopolymer. Provides very good gloss retention, good abrasion resistance, excellent slip and blocking resistance. It is insoluble in solvents... view more

Omnirad 127 (Former Irgacure 127) by IGM Resins is a highly efficient type I Photoinitiator that may be used to initiate the photo polymerization of unsaturated pre-polymers like acrylates-in... view more

Omnirad 127D by IGM Resins is a highly efficient type I photoinitiator that can be used to initiate the photo polymerization of unsaturated pre-polymers like acrylates in combination with mono or... view more

Omnirad 369 (Former Irgacure 369) by IGM Resins is a highly efficient UV-curing agent used to initiate the photo-polymerization of chemically unsaturated prepolymers like acrylates-in combination with... view more

Omnirad 369 E by IGM Resins is a type 1 free-radical photoinitiator. It is the electronic grade of Omnirad 369. It is a highly efficient UV-curing agent used to initiate the photo polymerization of... view more