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The material selection platform
Coatings Ingredients
The material selection platform
Coatings Ingredients
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10 products match your search
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POLYVEST® 110 by Evonik is a non-functionalized, hydrophobic, liquid polybutadiene grade. It is a stereospecific, low viscosity, unsaponifiable product with a high content of 1, 4-cis double bonds... view more
Polybutadiene. It is a stereospecific, low viscous and unsaponifiable liquid with a high content of 1,4-cis double bonds. Exhibits high chemical-, water- and cold-resistance. Provides high... view more
POLYVEST® eCO 110 Bio by Evonik is a stereospecific, low viscous and unsaponifiable polybutadiene with high content of 1,4-cis double bonds. It has been shown to reduce the use of fossil raw... view more
POLYVEST® eCO 130 Bio by Evonik is a stereospecific, low viscous and unsaponifiable polybutadiene with high content of 1,4-cis double bonds. It has been shown to reduce the use of fossil raw... view more
Surfynol® AS 5120 by Evonik is a wetting agent and defoamer. It offers dynamic wetting without generating excess foam over the most difficult surfaces including silicone release liners. It does not... view more
Surfynol® OP-340 by Evonik is a surfactant, wetting agent as well as defoamer. It is designed to be compatible and to perform well with the various acrylic resins commercially utilized in aqueous... view more
TEGO® Glide A 115 by Evonik is a flow/leveling and slip additive. It prevents patchy matting, pigment flooding, flotation and surface irregularities in solvent-borne formulations through the controlled... view more
Tego® Rad 2600 by Evonik acts as a cross-linkable release agent for radiation-curing formulations. Imparts good slip & defoaming effect and substrate wetting. Used in (litho) offset printing inks... view more
Silicone acrylate. Used as a release additive for radiation-curing formulations in offset printing inks, silk screen inks and overprint varnishes. Offers improved scratch resistance and marker... view more
Tego® Rad 2700 by Evonik acts as a release/ anti-blocking agent. Designed for radiation-curing formulations in (litho) offset printing inks, silk screen inks radiation-curing printing inks and... view more
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