AgiSyn™ 2826 by Covetsro is ethoxylated bisphenol A diacrylate. It is low skin irritation, odor and volatility monomer. It has a hydrophobic backbone for complete alkali solubility. It exhibits... view more

AgiSyn™ 2829 by Covetsro is tricyclodecane dimethanol diacrylate. It is a low viscosity di-functional monomer. It possesses low shrinkage, flexibility and adhesion. It exhibits good weatherability... view more

AgiSyn™ 2830 by Covestro is a high boiling point dipentaerythritol hexaacrylate monomer. It possesses good adhesion, flexibility and hardness. It exhibits good weatherability, water, abrasion and... view more

AgiSyn™ 2830L by Covestro is a dipentaerythritol hexaacrylate. It is a high boiling monomer that is used in free radical polymerization. It possesses good adhesion, flexibility and hardness. It... view more

AgiSyn™ 2831 by Covestro is a diethylene glycol dimethacrylate. It is a high boiling monomer with a low vapor pressure that is used in free radical polymerization. It possesses good chemical, water... view more

AgiSyn™ 2832 by Covestro is 2-phenoxyethyl acrylate. It exhibits excellent adhesion properties and diluting power. It possesses low shrinkage, good impact strength and flexibility. It is used in... view more

AgiSyn™ 2833 by Covestro is a dipropylene glycol diacrylate. It is a low viscosity and low volatility liquid functional monomer. It possesses good flexibility, diluting power, flexibility, adhesion... view more

AgiSyn™ 2836 by Covestro is a ethoxylated (3) trimethylopropane triacrylate. It is low skin irritation, low formulation viscosity and fast curing monomer. It possesses low volatility, flexibility... view more

AgiSyn™ 2837 by Covestro is propoxylated glyceryl triacrylate. It is a low viscosity, good flexibility, excellent hardness, and fast curing monomer for use in free radical polymerization. It... view more

AgiSyn™ 2839 by Covestro is a tetrahydrofurfuryl acrylate. It is a low viscosity, polar, monofunctional monomer, which contains a cyclic group. It promotes the adhesion to numerous substrates. It... view more

AgiSyn™ 2844 by Covestro is Ethoxylated (5) pentaerythritol tetraacrylate (PPTTA). It is a heat-resistant, fast-curing tetrafunctional monomer used in UV/EB polymerization. It possesses good... view more

AgiSyn™ 2846 by Covestro is neopentyl glycol diacrylate. It is a low viscosity, difunctional monomer. It provides chemical resistance, high reactivity, hardness, adhesion and water resistance... view more

AgiSyn™ 2848 by Covestro is glycol diacrylate. It can act as a good replacement for AgiSynTM 2815(TPGDA) in terms of reactivity, cutting power, gloss and adhesion. It possesses low volatility... view more

AgiSyn™ 2851-S by Covestro is tris (2-hydroxy ethyl) isocyanurate triacrylate. It is a white, crystalline, solid triazine compound, which is used in free radical polymerization. It possesses good... view more

AgiSyn™ 2852 by Covestro is cyclic trimethylolpropane formal acrylate. It offers good flexibility, good adhesion, low shrinkage and low yellowing. AgiSyn™ 2852 is suitable for a range of... view more

AgiSyn™ 2853 by Covestro is tridecyl acrylate. It is a low odor, low volatility, and low irritation monofunctional monomer with low ester content. It exhibits good water resistance, high... view more

AgiSyn™ 2858 by Covestro is ethoxylated trimethylopropane triacrylate. It provides low skin irritation, low shrinkage and good flexibility. It possesses chemical resistance, weatherability, abrasion... view more

AgiSyn™ 2867 by Covestro is ethoxylated trimethylolpropane triacrylate. It offers low skin irritation, low shrinkage and good flexibility. It possesses good adhesion, impact strength, and chemical... view more

AgiSyn™ 2869 by Covestro is propoxylated trimethylolpropane triacrylate. It shows low skin irritation and fast curing monomer for use in free radical polymerization. It possesses low formulation... view more

AgiSyn™ 2870 by Covestro is isobornyl acrylate. It is an excellent reactive diluent for oligomers. The cyclic group produces polymers through free radical curing, which have a high glass transition... view more