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The material selection platform
Coatings Ingredients
The material selection platform
Coatings Ingredients
by SpecialChem
 
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99 products match your search
Product Name
Supplier
Description
Covestro
AgiSyn™ 001 by Covestro is a reactive amine additive. It combines with other photo-initiators to increase the curing speed of UV coatings and improves the curing properties. It can be applied to... view more
Covestro
AgiSyn™ 002 by Covestro is a reactive amine additive. It combines with other photo-initiators to increase the curing speed of UV coatings. It offers low yellowing, high reactivity and a good balance... view more
Covestro
AgiSyn™ 003 by Covestro is an amine synergist. It combines with other photo-initiators to increase the curing speed of UV coatings and improves the curing properties. It exhibits a good balance of... view more
Covestro
AgiSyn™ 005 by Covestro is a reactive amine additive. It combines with other photo-initiators to increase the curing speed of UV coatings and improves the curing properties. It can be applied to... view more
Covestro
AgiSyn™ 006 by Covestro is a reactive amine additive. It combines with other photo-initiators to increase the curing speed of UV coatings. It can be applied to paper coatings... view more
Covestro
AgiSyn™ 007 by Covestro is a reactive amine additive. It combines with other photo-initiators to increase the curing speed of UV coatings. It can be applied to paper coatings... view more
Covestro
AgiSyn™ 008 by Covestro is reactive amine additive grade. It combines with other photo-initiators to increase the curing speed of UV coatings. It offers high reactivity and good adhesion properties... view more
Covestro
AgiSyn™ 1010 by Covestro is bisphenol A epoxy acrylate. It possesses excellent chemical and scratch resistance. It exhibits high gloss and reactivity. It shows broad compatibility with other energy... view more
AgiSyn™ 1010-A80 by Covestro is a bisphenol A epoxy acrylate diluted in 20% TPGDA. It possesses high reactivity and high gloss. It exhibits good chemical and scratch resistance. It shows good... view more
AgiSyn™ 1010-B80 by Covestro is a general-purpose Bisphenol A epoxy acrylate diluted with 20% HDDA. It possesses good UV/EB cure reactivity, good surface hardness, solvent resistance and high gloss... view more
AgiSyn™ 1010-C80 by Covestro is bisphenol A epoxy acrylate diluted with 20% TMPTA. It possesses good UV/EB cure reactivity, high gloss, surface hardness and low odor. It combines superior... view more
AgiSyn™ 1010-D75 by Covestro is epoxy acrylate diluted with 25% DPGDA. It possesses good UV/EB cure reactivity and high gloss. It exhibits good surface hardness and solvent resistance. It combines... view more
AgiSyn™ 1010-D80 by Covestro is epoxy acrylate diluted with 20% DPGDA. It possesses good UV/EB cure reactivity and high gloss. It exhibits good surface hardness and solvent resistance. It combines... view more
AgiSyn™ 1010-G80 by Covetsro is bisphenol A epoxy acrylate diluted with 20% GPTA. It possesses good UV/EB cure reactivity and high gloss. It exhibits good surface hardness and low odor. It offers... view more
AgiSyn™ 1010-K75 by Covestro is an epoxy acrylate diluted with 25% GDA. It possesses good UV/EB cure reactivity and high gloss. It exhibits a low viscosity and fast cure. It is designed specifically... view more
AgiSyn™ 1010-P80 by Covestro is an epoxy acrylate diluted with 20% 2-PEA. It possesses good UV/EB cure reactivity and high gloss. It exhibits a low viscosity and fast cure. It is designed... view more
Covestro
AgiSyn™ 1801 by Covestro acts as a photo-initiator. It can be used to initiate radical photo-polymerization of unsaturated resins such as a prepolymer acrylates in combination with mono - or... view more
Covestro
AgiSyn™ 1809 by Covestro is 2-Methyl-1[4-(methylthio)pheny]-2-morpholinopropan-1-one. It acts as a UV curing agent. It can be used to initiate the photopolymerization of chemically unsaturated... view more
Covestro
AgiSyn™ 1810 by Covetsro acts as a highly efficient non-yellowing photoinitiator. It is used to initiate the photo-polymerization of chemically unsaturated systems such as a pre-polymer - e.g... view more
Covestro
AgiSyn™ 1811 by Covestro is 2,4,6-Trimethylbenzoyldiphenyl phosphine oxide. It can be used for pigmented systems without sacrificing activity. It is recommended for thin-film as well as... view more
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