BMP

BMP by Wuhan Bolachem New Material is butyne glycol ether. It is suitable for the synthesis and preparation for hydrosilylation of acetylenic alcohol-modified polysiloxane surfactant, which can be used as super wetting-, defoaming agent and foam suppressor.

• It possesses high purity and is easy for industrial reactions.
• It offers low foaming, substrate wetting, anti-crater and leveling properties.
• BMP is used in water-based coatings and inks.