AGOCEL I 155 D by CHT Group is a natural, dispersible, pseudoplastic, rheology modifier and thickener. It controls the consistency, processing, flow behavior and storability of synthetic resin or... view more

AGOCEL I 50 D by CHT Group is a dispersible, natural, rheology modifier and thickener. This pseudoplastic additive controls the consistency, processing, flow behavior and storability of synthetic... view more

AGOCEL I-30 D by CHT Group is a natural, pseudoplastic, highly viscous, rheology modifier and thickener. It controls the consistency, processing, flow behavior and storability of synthetic resin or... view more

AGOCEL I-5 D by CHT Group is a low viscosity, natural, dispersible rheology modifier and thickener. It controls the consistency, processing, flow behavior and storability of synthetic resin or... view more

AGOCEL V 600 by CHT Group is a pseudoplastic, dispersible, rheology modifier, thickener and anti-settling agent. It possesses thixotropic effect. AGOCEL V 600 controls the consistency, processing... view more

AGOCEL X 1000 by CHT Group is a synthetic, rheology modifier and thickener. It controls the consistency, processing, flow behavior and storability of synthetic resin or minerally bound systems... view more

AGOCEL® I 115 D by CHT Group is a natural, pseudoplastic, rheology modifier and thickener. It controls the consistency, processing, flow behavior and storability of synthetic resin or minerally bound... view more

AGOCEL® V 500 D by CHT Group is a natural, pseudoplastic rheology modifier, thickener and anti-settling agent. This dispersible powder controls the consistency, processing, flow behavior and storability... view more

CALOR PLUS by CHT Group is a solvent-free, leveling and surface additive. It prevents flow disruptions and improves scratch stabilities. It is suited for solvent-based, aqueous and UV-crosslinking... view more

CALOR SIL by CHT Group is a non-ionic, solvent-free, leveling and surface additive with high effectiveness. It is suited for aqueous systems. It prevents flow disruptions and improves scratch... view more

HANSA ADD 1010 by CHT Group is a solvent-free, non-ionic, organo modified polysiloxane-based leveling and surface additive. It is suitable for solvent-based and aqueous systems. It prevents flow... view more

HANSA ADD 1045 by CHT Group is a solvent-free, organomodified polysiloxane-based leveling and surface additive. It prevents flow disruptions and improves scratch stabilities with high effectiveness... view more

HANSA ADD 1059 by CHT Group is organomodified polysiloxane-based substrate wetting agent. It decreases the interfacial tension between substrate and a liquid. It reduces the surface tension with... view more

HANSA ADD 1060 by CHT Group is a non-ionic, organomodified trisiloxane-based substrate wetting agent. It decreases the interfacial & surface tension between substrate & a liquid. It is suitable for... view more

HANSA ADD 1065 by CHT Group is a non-ionic, low foaming, organomodified trisiloxane-based substrate wetting agent. It is suitable for solvent-based and aqueous systems. It decreases the interfacial... view more

HANSA ADD 1075 by CHT Group is organomodified polysiloxane-based defoamer and deaerator. It possesses outstanding defoaming and deaerating properties. This concentrate possesses high effectiveness... view more

HANSA ADD 1195 by CHT Group is organomodified siloxane-based defoamer and deaerator. It possesses outstanding defoaming and deaerating properties. It is suitable for solvent-based systems. HANSA ADD... view more

HANSA ADD 1225 by CHT Group is a solvent-free, non-ionic, organomodified polysiloxane-based leveling and surface additive. It prevents flow disruptions and improves scratch stabilities with high... view more

HANSA ADD 1364 by CHT Group is a low foaming, organomodified polysiloxane-based substrate wetting agent. It decreases the interfacial & surface tension between substrate and a liquid. It is suitable... view more

HANSA ADD 150 by CHT Group is a non-ionic, organomodified trisiloxane-based substrate wetting agent. It decreases the interfacial tension between substrate and a liquid. It is suitable for... view more