The Universal Selection Source: Coatings Ingredients

Patent

METHOD OF MAKING POLYSILOXANE FILMS


Application Date:
Sep 15, 2016
USPTO Patent:
US 14405541
Abstract:

The present invention is a resin composition characterized by being able to undergo elastic deformation, having little residual strain rate and exhibiting stress relaxation properties. More specifically, the present...

Inventors:
Tomoaki SAWADA, Osaka (JP)
Takatoshi ABE, Osaka (JP)
Shingo YOSHIOKA, Osaka (JP)
International Classification:
C09D 163/00 (20160915)

Claims

What is claimed is:

1-8. (canceled)

Description

TECHNICAL FIELD

The present invention relates to a resin composition having high tensile stress relaxation properties and excellent recoverability following extension, and also to a film that uses this resin composition.

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